Improving implant features, boosting osseointegration, making surfaces more hydrophilic, removing hydrocarbon pollutants, activating tissue cells with plasma, and reducing recovery time
DSI Point Plasma is a specialized device designed to enhance the characteristics of regular implants and increase the osseointegration process speed. It works by rendering the implant surface more hydrophilic and eliminating hydrocarbon pollutants that tend to accumulate on the surface over time. This enhanced hydrophilicity fosters bone formation on the implant surface, leading to improved osseointegration and reduced recovery time. Additionally, the application of plasma stimulates tissue cells, boosting blood circulation and facilitating tissue regeneration.
The most remarkable advantage of this technology is that it not only cleans the implant surface and optimizes the implantation procedure but also does so swiftly, completing the process in just 60 seconds. This efficiency means it can be performed spontaneously without the need for pre-planning. Moreover, the operation is carried out without compromising the integrity of the implant packaging, ensuring its sterility and immediate usability.
During the plasma implant activation process, microscopic carbon-based contaminants are effectively removed, while surface energy is increased, enhancing wettability and promoting protein and cell interactions at a molecular level. Furthermore, the device can process two implants simultaneously while maintaining the sterile barrier, further streamlining the procedure.
Indications:
Enhancing the characteristics of regular implants
Streamlining the osseointegration process
Rendering implant surfaces more hydrophilic
Eliminating hydrocarbon pollutants
Stimulating tissue cells with plasma
Shortening overall recovery times
Features & Benefits:
Significantly improves implant characteristics for superior performance
Enhances the osseointegration process, ensuring successful integration with the bone
Converts implant surface to highly hydrophilic, optimizing biological interactions
Removes hydrocarbon pollutants, ensuring a clean and pristine implant surface
Stimulates bone formation directly on the implant surface, fostering faster healing
Utilizes plasma energy to activate tissue cells, promoting accelerated tissue regeneration
Swift operation completed in just 60 seconds, maximizing efficiency
Offers flexibility for spontaneous use, eliminating the need for meticulous pre-planning
Maintains the integrity of implant packaging
Ensures immediate implant readiness without compromising sterility
Capable of processing two implants simultaneously, optimizing time and resources
Compatible with any implant brand with a clear sterile vial packaging
Technical Characteristics:
Model: Plasma Active
Size: 150 x 354 x 267mm
Display: Capacitive touch IPS LCD
Capacity: 2 Implants vials up to 65mm height / 28mm thickness
